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Macro analysis of line edge and line width roughness [6152-33]

Author(s):
Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Jung, Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S. G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H. -K. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J. -T. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520X
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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