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Small feature accuracy challenge for CD-SEM metrology: physical model solution [6152-28]

Author(s):
Bunday, B. ( International SEMATECH Manufacturing Initiative (USA) )
Allgair, J. ( International SEMATECH Manufacturing Initiative (USA) and Freescale Semiconductor, Inc. (USA) )
Adan, O. ( Applied Materials (Israel) )
Tam, A. ( Applied Materials (Israel) )
Latinskim, S. ( Applied Materials (Israel) )
Eytan, G. ( Applied Materials (Israel) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61520S
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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