Scatterfield microscopy using back focal plane imaging with an engineered illumination field [6152-19]

Author(s):

Patrick, H. J. ( National Institute of Standards and Technology (USA) )

Attota, R. ( National Institute of Standards and Technology (USA) )

Barnes, B. M. ( National Institute of Standards and Technology (USA) )

Germer, T. A. ( National Institute of Standards and Technology (USA) )

Stocker, M. T. ( National Institute of Standards and Technology (USA) )

Silver, R. M. ( National Institute of Standards and Technology (USA) )

Bishop, M. R. ( International SEMATECH (USA) )

2 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

1

Page(from):

61520J

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings