Characterization of line edge roughness using CD-SAXS [6152-23]

Characterization of line edge roughness using CD-SAXS [6152-23]

Author(s):

Jones, R.J. ( National Institute of Standards and Technologh (USA) )

Wu, W. ( National Institute of Standards and Technologh (USA) )

Wang, C. ( National Institute of Standards and Technologh (USA) )

Lin, E. K. ( National Institute of Standards and Technologh (USA) )

Choi, K. ( National Institute of Standards and Technology (USA)and Intel (USA) )

Rice, B. J. ( Intel (USA) )

Thompson, G. M. ( Intel (USA) )

Weigand, S. J. ( Advanced Photon Source (USA) )

Keane, D. T ( DAD-CAT, Advanced Photon Source (USA) )

4 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

1

Page(from):

61520N

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

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