Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM [6151-148]

Author(s):

Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Niimi,G. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yamatani, D. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Joshima, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Bessho,K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Shirai,T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Takemura,T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yokota, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yabuta,H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Paul, K. C. ( Ushio Inc. (Japan) )

Kabuki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hotta,K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yoshioka,M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sato,H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

11 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

615147

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings