EUV source collector [6151-131]
- Author(s):
Bowering N R ( Cymer Inc. (USA) ) Ershov A I ( Cymer Inc. (USA) ) Marx W F ( Cymer Inc. (USA) ) Khodykin O V ( Cymer Inc. (USA) ) Hansson B A M ( Cymer Inc. (USA) ) Vargas E ( Cymer Inc. (USA) ) Chavez L J A ( Cymer Inc. (USA) ) Fomenkov I V ( Cymer Inc. (USA) ) Myers D W ( Cymer Inc. (USA) ) Brandt D C ( Cymer Inc. (USA) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61513R
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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