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Study of ruthenium-capped multilayer mirror for EUV irradiation durability [6151-109]

Author(s):
Takase, H ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Terashima, S ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Gomei, Y ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Tanabe, M ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Watanabe, Y ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Aoki, T ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Murakami, K ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Matsunari, S ( Extreme Ultraviolet Lithography System Development Asspcoatopm (Japan) )
Niibe, M ( Univ. of Hyogo (Japan) )
Kakutani, Y ( Univ. of Hyogo (Japan) )
5 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
2
Page(from):
615135
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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