Effect of charged-particle bombardment on collector mirror reflectivity in EUV lithography devices [6151-105]

Effect of charged-particle bombardment on collector mirror reflectivity in EUV lithography devices [6151-105]

Author(s):

Allain, J. P. ( Argonne National Lab. (USA) )

Nieto, M. ( Argonne National Lab. (USA) )

Hassanein, A. ( Argonne National Lab. (USA) )

Titov, V ( Argonne National Lab. (USA) )

Plotkin, P. ( Argonne National Lab. (USA) )

Hendricks, M. ( Argonne National Lab. (USA) )

Hinson, E. ( Middlebury College (USA) )

Chrobak, C. ( Univ. of Wisconsin, Madsison (USA) )

van der Velden, M.H.L. ( Technische Univ. Eindhoven (Netherlands) )

Rice, B. ( Intel Corp (USA) )

5 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

615131

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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