Planarization for reverse-tone step and flash imprint lithography [6151-89]

Planarization for reverse-tone step and flash imprint lithography [6151-89]

Author(s):

Lin, M. W. ( The Univ. of Texas at Austin (USA) )

Chao, H. L. ( The Univ. of Texas at Austin (USA) )

Hao, J. ( The Univ. of Texas at Austin (USA) )

Kim, E. K. ( The Univ. of Texas at Austin (USA) )

Palmieri, F. ( The Univ. of Texas at Austin (USA) )

Kim, W. C. ( The Univ. of Texas at Austin (USA) )

Dickey, M. ( The Univ. of Texas at Austin (USA) )

Ho, P. S. ( The Univ. of Texas at Austin (USA) )

Willson, C. G. ( The Univ. of Texas at Austin (USA) )

4 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

61512G

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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