The effects of wafer-scan induced image blur on CD control image slope and process window in maskless lithography [6151-86]

The effects of wafer-scan induced image blur on CD control image slope and process window in maskless lithography [6151-86]

Author(s):

Chen Y. ( Micron Technology Inc. (USA) )
Shroff Y. ( Intel Corp. (USA) )

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

61512D

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

Similar Items:

1 Conference Proceedings Image optimization for maskless lithography Shroff, Y.A., Chen, Y., Oldham, W.G. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Across-wafer CD uniformity control through lithography and etch process: experimental verification Q. Zhang, C. Tang, J. Cain, A. Hui, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, C. J. Spanos SPIE - The International Society of Optical Engineering
2 Conference Proceedings Achieving mask-based imaging with optical maskless lithography [6151-87] Stone, E. M., Hintersteiner, J. D., Cebuhar, W. A., Albright, R., Eib, N. K., Latypov, A., Baba-Ali, N., Poultney, S. … SPIE - The International Society of Optical Engineering	8 Conference Proceedings The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment Chou, W.Y., Yen, S.M., Wu, J.K., Shieh, W.B., Chuang, M., Fan, G., Tseng, C.C., Hughes, G.P., MacDonald, S.S., Holiday, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Layout decompression chip for maskless lithography Nikolic, B., Wild, B., Dai, V., Shroff, Y.A., Warlick, B., Zakhor, A., Oldham, W.G. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Real-time process control to prevent CD variation induced by postexposure delay Ku,C.-Y., Lei,T.F., Shieh,J.-M., Chiou,T.-B., Chen,Y.-C. SPIE-The International Society for Optical Engineering
4 Conference Proceedings OPC methods to improve image slope and process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Using OPC to optimize for image slope and improve process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Spectroscopic CD metrology for sub-100-nm lithography process control Mieher, W.D., Dziura, T.G., Chen, X., DeCecco, P., Levy, A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings CD control using latent image for lithography T. Koizumi, T. Matsuo, M. Endo, M. Sasago Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings EUV pellicle development for mask defect control [6151-04] Shroff, Y. A, Goldstein, M, Rice, B, Lee, S. H, Ravi, K. V SPIE - The International Society of Optical Engineering	12 Conference Proceedings Towards systematic CD process control for e-beam lithography Kalus, C. K. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12