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Effects of low-voltage electron beam lithography [6151-85]

Author(s):
  • Bolorizadeh M. ( Univ. of Tennessee (USA) )
  • Joy D. C. ( Univ. of Tennessee (USA) and Oak Ridge National Lab. (USA) )
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
2
Page(from):
61512C
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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