Phase-shift mask for EUV lithography [6151-69]

Phase-shift mask for EUV lithography [6151-69]

Author(s):

Constancias, C. ( CEA-LETI (France) )

Richard, M. ( CEA-LETI (France) )

Joyeux, D. ( CNRS/LCF-IOTA (France) )

Chiaroni, J. ( CEA-LETI (France) )

Blanc, R. ( CEA-LETI (France) )

Robic, J. Y. ( CEA-LETI (France) )

Quesnel, E. ( CEA-LETI (France) )

Muffato, V. ( CEA-LETI (France) )

3 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

2

Page(from):

61511W

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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