Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates [6151-50]
- Author(s):
Young, S. R. ( Motorola Labs. (USA) ) Dauksher, W. J. ( Motorola Labs. (USA) ) Nordquist, K. J. ( Motorola Labs. (USA) ) Ainley, E. S. ( Motorola Labs. (USA) ) Gehoski, K. A. ( Motorola Labs. (USA) ) Graupera, A. A. ( FEI Co. (USA) ) Moriarty, M. H. ( FEI Co. (USA) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61511D
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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