Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]
- Author(s):
Kim, S. S. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, J. ( Samsung Electronics Co., Ltd. (South Korea) ) Chalykh, R. ( Samsung Electronics Co., Ltd. (South Korea) ) Kang, J. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S. G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H. K. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J. T. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Emerging Lithographic Technologies X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6151
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61511C
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- Language:
- English
- Call no.:
- P63600/6151
- Type:
- Conference Proceedings
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