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Phase defect observation using an EUV microscope [6151-46]

Author(s):
Hamamoto, K. ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Tanaka, Y. ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Yoshizumi, T. ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Fukushima, Y. ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Shiotani, H. ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Sakaya, N. ( HOYA Corp. (Japan) and CREST-JST (Japan) )
Hosoya, M ( HOY A Corp. (Japan) and CREST-JST (Japan) )
Shoki, T ( HOY A Corp. (Japan) and CREST-JST (Japan) )
Watanabe, T ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
Kinoshita, H ( Univ. of Hyogo (Japan) and CREST-JST (Japan) )
5 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
1
Page(from):
615119
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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