EUV sources for the alpha-tools [6151-25]

EUV sources for the alpha-tools [6151-25]

Author(s):

Pankert, J. ( Philips Extreme UV GmbH (Germany) )

Apetz, R. ( Philips Extreme UV GmbH (Germany) )

Bergmann, K. ( Fraunhofer Institut fur Lasertedhnik (Germany) )

Damen, M. ( Philips Extreme UV GmbH (Germany) )

Derra, G. ( Philips Research Labs. (Germany) )

Franken, O. ( Fraunhofer Institut fur Lasertedhnik (Germany) )

Jassen, M. ( Philips Extreme UV GmbH (GmbH (Germany) )

Jonkers, J. ( Philips Extreme UV GmbH (GmbH (Germany) )

Klein, J. ( Fraunhofer Institut fur Lasertechnik (Germany) )

Kraus, H. ( Philips Extreme Uv GmbH (Germany) )

Krucken, T. ( Philips Researc Labs. (Germany) )

List, A. ( Philips Extreme UV GmbH (germany) )

Loeken, M ( Philips Extreme UV GmbH (germany) )

Madex A ( Fraunhofer Institut fur Lasertechnik (Germany) )

Metzmacher, C ( Philips Research Labs (Germany) )

Neff, W ( Fraunhofer Institut fur Lasertechnik (Germany) )

Probst, S ( Fraunhofer Institut fur Lasertechnik (Germany) )

Prummer, R ( Fraunhofer Institut fur Lasertechnik (Germany) )

Rosier, O ( Fraunhofer Institut fur Lasertechnik (Germany) )

Schwabe, S ( Philips Extreme UV GmbH (Germany) )

Seiwert, S ( Fraunhofer Institut fur Lasertechnik (Germany) )

Siemons, G ( Philips Extreme UV GmbH (Germany) )

Vaudrevange, D ( Philips Extreme UV GmbH (Germany) )

Wagemann, D ( Philips Extreme UV GmbH (Germany) )

Weber, A ( Philips Research Labs (Germany) )

Zink P ( Philips Exterme UV GmbH (Germany) )

Zitzen, O ( Philips Exterme UV GmbH (Germany) )

22 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

61510Q

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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