Defect inspection for imprint lithography using a die to database electron beam verification system [6151-22]

Defect inspection for imprint lithography using a die to database electron beam verification system [6151-22]

Author(s):

Myron, L. J ( Molecular Imprints Inc (USA) )

Thompson ( Molecular Imprints Inc (USA) )

McMackin, I. ( Molecular Imprints Inc (USA) )

Resnick, D. J. ( Molecular Imprints Inc (USA) )

Kitamura, T. ( NancGeometry Research, Inc.(Japan) )

Hasebe, T ( NancGeometry Research, Inc.(Japan) )

Nakazawa, S ( NancGeometry Research, Inc.(Japan) )

Tokumoto, T. ( NancGeometry Research, Inc.(Japan) )

Ainley, E. ( Motorola Labs (USA) )

Nordquist, K ( Motorola Labs (USA) )

Dauksher, W. J. ( Motorola Labs (USA) )

6 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

61510M

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

Similar Items:

1 Conference Proceedings Direct die-to-database electron-beam inspection of fused silica imprint templates [6349-86] Tsuneoka, M., Hasebe, T., Tokumoto, T., Yan, C., Yamamoto, M., Resnick, D. J., Thompson, E., Wakamori, H., lnoue, M., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings High resolution defect inspection of Step and Flash imprint lithography for 32 nm half-pitch patterning I. McMackin, J. Perez, K. Selenidis, J. Maltabes, D. Resnick Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates [6151-50] Young, S. R., Dauksher, W. J., Nordquist, K. J., Ainley, E. S., Gehoski, K. A., Graupera, A. A., Moriarty, M. H. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Analysis of critical dimension uniformity for Step and Flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Introduction of a die-to-database verification tool for mask geometry NGR4000 [6349-150] Hoffman, M. J., Kitamura, T., Kubota, K., Hasebe, T., Nakazawa, S., Tokumoto, T., Tsuneoka, M., Yamamoto, M., lnoue, M. SPIE - The International Society of Optical Engineering	9 Conference Proceedings High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Shaped beam technology for nano-imprint mask lithography Hudek, P., Beyer, D., Groves, T. R., Fortagne, O. K., Dauksher, W. J., Mancini, D. P., Nordquist, K. J., Resnick, D. J. SPIE - The International Society of Optical Engineering	10 Conference Proceedings An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography W. J. Dauksher, N. V. Le, K. A. Gehoski, E. S. Ainley, K. J. Nordquist, N. Joshi SPIE - The International Society of Optical Engineering
5 Conference Proceedings Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Inspection and repair issues for Step-and-Flash Imprint Lithography templates Nordquist, K. J., Dauksher, W. J., Mancini, D. P., Resnick, D. J., Hess, H. F., Pettibone, D. W., Adler, D., Bertsche, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a … T. Kitamura, T. Hasebe, K. Kubota, F. Sakai, S. Nakazawa Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Imprint technology: a potential low-cost solution for sub-45 nm device applications [6151-93] Le, N. V., Dauksher, W. J., Gehoski, K. A., Nordquist, K. J., Ainley, E., Mangat, P. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12