Effect ofresidual gas atmosphere on lifetime of Ru-capped EUVl projection optics mirror [6151-17]

Effect ofresidual gas atmosphere on lifetime of Ru-capped EUVl projection optics mirror [6151-17]

Author(s):

Kakutani, Y ( Univ. of Hyogo (Japan) )

Nilbe, M. ( Univ. of Hyogo (Japan) )

Gomei, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Talase, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Terashima, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Matsunari, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Aoki, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Murakami, K ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Fukuda, Y ( Extreme Ultraviolet Lithography System Development Association (Japan) )

4 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

61510H

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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