EUV testing of multilayer mirrors: critical issues [6151-15]

EUV testing of multilayer mirrors: critical issues [6151-15]

Author(s):

Hill, S. B. ( National Institute of Standards and Technology (USA) )

Ermanoski, I. ( National Institute of Standards and Technology (USA) )

Grantham, S. ( National Institute of Standards and Technology (USA) )

Tarrio, C. ( National Institute of Standards and Technology (USA) )

Lucatorto, T. B. ( National Institute of Standards and Technology (USA) )

Madey, T. E. ( Rutgers Univ. (USA) )

Bajt, S. ( Lawrence Livermore National Lab. (USA) )

Chandhok, M. ( Intel Corp. (USA) )

Yan, P. ( Intel Corp. (USA) )

Wood, O. ( SENATECG(USA) )

Wurm, S. ( SENATECG(USA) )

Edwards, N. V. ( SENATECG(USA) )

7 more

Publication title:

Emerging Lithographic Technologies X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6151

Pub. Year:

2006

Pt.:

1

Page(from):

61510F

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

Language:

English

Call no.:

P63600/6151

Type:

Conference Proceedings

Details

TDL ID:	ZA00016183
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2006 : 10th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.23

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