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Evaluation of resolution and LER in the resist patterns replicated by EUV micro-exposure tools [6151-07]

Author(s):
Kikuchi, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
Tanaka, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
Oizumi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )
Kumasaka, F. ( Association of Super-Advanced Electronics Technologies (Japan) )
Goo, D. ( Association of Super-Advanced Electronics Technologies (Japan) )
Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )
1 more
Publication title:
Emerging Lithographic Technologies X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6151
Pub. Year:
2006
Pt.:
1
Page(from):
615107
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
Language:
English
Call no.:
P63600/6151
Type:
Conference Proceedings

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