Grey scale electron-beam lithography in functionalized SU-8 for active optical devices [6110-12]

Grey scale electron-beam lithography in functionalized SU-8 for active optical devices [6110-12]

Author(s):

Balslev, S. ( Technical Univ. of Denmark (Denmark) )
Rasmussen, T. ( Technical Univ. of Denmark (Denmark) )
Kristensen, A. ( Technical Univ. of Denmark (Denmark) )

Publication title:

Micromachining technology for micro-optics and nano-optics IV : 23-25 January 2006, San Jose California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6110

Pub. Year:

2006

Page(from):

61100C

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461520 [0819461520]

Language:

English

Call no.:

P63600/6110

Type:

Conference Proceedings

Details

TDL ID:	ZA00016144
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : Micromachining Technology for Micro-Optics and Nano-Optics
Conf. info. (Number):	2006 : 4th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.01.23-2006.01.25

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