Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics (Invited Paper) [6002-24]

Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics (Invited Paper) [6002-24]

Author(s):

Fujii N.

Kkohmura K.

Nakayama T.

Tanaka H. ( MIRAI-ASET (Japan); )

Hata N.

Kikkawa T. ( MIRAI-ASSRC-AIST (Japan); and Hiroshima Univ. (Japan) )

1 more

Publication title:

Nanofabrication: Technologies, Devices, and Applications II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6002

Pub. Year:

2005

Page(from):

60020N

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460264 [0819460265]

Language:

English

Call no.:

P63600/6002

Type:

Conference Proceedings

Details

TDL ID:	ZA00016038
Series ID:	PA00000029
Conf. info. (Name):	Optics East : Nanofabrication
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2005.10.23-2005.10.25

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