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Integrated post tape outflow for fast design to mask turn-around time [5992-172]

Author(s):
Hung, C. -Y.
Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
Zhang, L. ( Mentor Graphics Corp. (China) )
Shang, S.
Bailey, G. E.
Jost, A.
Brist, T. ( Mentor Graphics Corp. (USA) )
2 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
599251
Page(to):
599251
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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