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Characterization and qualification of the Jeol JBX9000-MVII e-beam writer for the 9Onm node and its integration in a photomask manufacturing line [5992-167]

Author(s):
Raffaele, L.
Poliani, C.
Cassol, G. L.
Bianucci, G.
Murai, S. ( DNP Photomask Europe Spa (Italy) )
Murata, S.
Hikichi, R.
Katsuki, H.
Noguchi, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
4 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59924W
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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