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Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]

Author(s):
Kitada, M.
Yusa, S.
Kuwahara, N.
Fujita, H.
Takikawa, T.
Sano, H.
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59924R
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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