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Reticle haze measurement by spectroscopic elipsometry [5992-156]

Author(s):
Kim, Y. -H.
Kim, S. -J.
Park, J. -B.
Jung, M. -L. ( Hanyang Univ. (South Korea) )
Kim, S. -H. ( Samsung Electronics (South Korea) )
Park, S. -W.
Kyoung, J. -S.
An, I. -S.
Oh, S. -K. ( Hanyang Univ. (South Korea) )
4 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59924L
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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