Electrostatic chucking and EUVL mask flatness analysis [5992-128]

Electrostatic chucking and EUVL mask flatness analysis [5992-128]

Author(s):

Nataraju, M.
Mikkelson, A.
Sohn, J.
Engelstad, R. L.
Lovell, E. G. ( Univ. of Wisconsin, Madison (USA) )

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

2

Page(from):

59923S

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

Similar Items:

1 Conference Proceedings Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking [6349-124] Nataraju, M., Sohn, J., Mikkelson, A. R., Turner, K. T., Engelstad, R. L., Van Peski, C. K. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Compensating for image placement errors induced during the fabrication and chucking of EUVL masks R. L. Engelstad, J. Sohn, A. R. Mikkelson, M. Nataraju, K. T. Turner Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Effect of electrostatic chucking on EUVL mask flatness Mikkelson, A. R., Engelstad, R. L., Lovell, E. G., Aschke, L., Ruggeberg, F., Sobel, F. SPIE - The International Society of Optical Engineering	8 Conference Proceedings EUV mask and chuck analysis: simulation and experimentation [6151-12] Nataraju, M., Sohn, J, Mikkelson, A. R., Turner, K. T., Engelstad, R. L., Van Peski, C. K. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Electrostatic chucking of EUVL reticles M. Nataraju, J. Sohn, A. R. Mikkelson, R. L. Engelstad, K. T. Turner, C. K. V. Peski, K. J. Orvek SPIE - The International Society of Optical Engineering	9 Conference Proceedings Characterizing the response of an EUV reticle during electrostatic chucking [6281-10] Engelstand, L. R., Lovell, G. E., Mikkelson,, R. A., Nataraju, M., Ramaswamy, V., Sohn, J., Dicks, A. G., Abdo, Y. A., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks R. L. Engelstad, K. T. Turner, M. Nataraju, J. Sohn, A. R. Mikkelson Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings The influence of an electrostatic pin chuck on EUV mask flatness Dicks, G. A., Mikkelson, A. R., Engelstad, R. L. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Predicting and correcting for image placement errors during the fabrication of EUVL masks R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner SPIE - The International Society of Optical Engineering	11 Conference Proceedings Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking [5992-129] Ramaswamy, V., Mikkelson, A., Engelstad, R., Lovell, E. G. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Modeling LEEPL mask fabrication processes Azkorra, X., Mikkelson, A.R., Engelstad, R.L., Lovell, E.G., Chang, J., Sohn, J., Nataraju, M., Eguchi, H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Mask-related distortions of modified fused silica reticles for 157-nm lithography Mikkelson,A.R., Abdo,A.Y., Cotte,E.P., Sohn,J., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12