Enhanced resist and etch CD control by design perturbation [5992-125]

Enhanced resist and etch CD control by design perturbation [5992-125]

Author(s):

Gupta, P. ( Blaze DFM Inc. (USA) )
Kahng, A. B. ( Blaze DFM, Inc. (USA) and Univ. of California at San Diego (USA) )
Park, C. -H. ( Univ. of California at San Diego (USA) )

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

2

Page(from):

59923P

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

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