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Model-based DRC for design and process integration [5992-122]

Author(s):
  • Hung, C. -Y. ( Semiconductor Manufacturing International Corp. (China) )
  • Jost, A. M. ( Mentor Graphics Corp. (USA) )
  • Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59923M
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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