Blank Cover Image

Mask cleaning strategies: haze elimination [5992-118]

Author(s):
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59923H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask cleaning strategies: particle elimination with minimal surface damage [5992-117]

Osborne, S., Nanningas, M., Takahashi, H., Woster, E., Kanda, C., Tibbe, J.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings A new model of haze generation and storage-life-time estimation for mask

S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Ohtsuki, A. Naitoh, N. Hayashi

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Mask cleaning strategies: a continuous ion removal concept [6283-37]

Osborne, S., Takahashi, H., Woster, E.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings A new model of haze generation and storage-life-time estimation for mask [6349-53]

Shimada, S., Kanda, N., Takahashi, N., Nakajima, H., Tanaka, H., Ishii, H., Shoji, Y., Otsuki, M., Naito, A., Hayashi, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Damage free megasonic resonance cleaning for the 45nm design rule

S. Osborne, V. Baudiquez, T. Rode, C. Chovino, H. Takahashi, E. Woster

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography [5992-198]

Eicheniaub, S., Dietze, S., Ikuta, Y., Popp, H., Goncher, K., Marmillion, P., Rastegar, A.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Mask quality assurance in cleaning for haze elimination using flexible mask specifications

K. Otsubo, S. Yamaguchi, Y. Arisawa, H. Mukai, T. Kotani, H. Mashita, H. Hashimoto, T. Kamo, T. Tsutsui, O. Ikenaga

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Phase shiff improvement in ArF/KrF haze-free mask cleaning

C. Liu, S. Zhao, E. Guo, S. Hasegawa, K. Nemoto

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Process optimization for particle removal on blank chrome mask plates in preparation for resist application

Osborne,S., Smith,E., Woster,E., Pelayo,A.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Advanced mask cleaning techniques for sub-100-nm technology nodes [5992-53]

Papanu, J. S., Gouk, R., Franklin, C., Chen, H. -W., Verhaverbeke, S., Ko, A., Child, K., Boelen, P., Shrauti, S., …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Reticle haze measurement by spectroscopic elipsometry [5992-156]

Kim, Y. -H., Kim, S. -J., Park, J. -B., Jung, M. -L., Kim, S. -H., Park, S. -W., Kyoung, J. -S., An, I. -S., Oh, S. -K.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings CD measurement of angled lines on high-end masks and its calibration method [5992-152]

Ataka, M., Kitayama, Y., Takahashi, K., Nakamura, N., Santo, I., Satoh, H., Anazawa, N.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12