Influence of organic contamination on photomask performance [5992-116]
- Author(s):
- Chovino, C. ( Advanced Mask Technology Ctr. GmbH (Germany) )
- Helbig, S.
- Dieckmann, W. ( STEAG HamaTech AG (Germany) )
- Bubke, K. ( Advanced Mask Technology Ctr. GmbH (Germany) )
- Dress, P. ( STEAG HamaTech AG (Germany) )
- Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 59923F
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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