Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]
- Author(s):
Chen, T. Van Den Broeke, D. Hsu, S. Park, S. Berger, G. Coskun, T. de Vocht, J. Chen, F. ( ASML MaskTools, Inc. (USA) ) Socha, R. ( ASML TDC (USA) ) Park, J. Gronlund, K. ( ASML MaskTools, Inc. (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 599239
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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