Optimization of Alt-PSM structure for 45nm node ArF immersion lithography [5992-109]

Optimization of Alt-PSM structure for 45nm node ArF immersion lithography [5992-109]

Author(s):

Adachi, T.

Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

1 more

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

2

Page(from):

599238

Page(to):

599238

Pages:

1

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

Similar Items:

1 Conference Proceedings Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ Mesuda, K., Toyama, N., Narukawa, S., Morikawa, Y., Mohri, H., Hayashi, N., Hoga, M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings PSM quartz etch depth evaluation with an atomic force microscope Noguchi, K., Sasaki, S., Yoshida, Y., Adachi, T., Abe, T., Mohri, H., Kokubo, H., Morikawa, Y., Hayashi, N. SPIE-The International Society for Optical Engineering
2 Conference Proceedings 45-32-nm node photomask technology with water immersion lithography [6349-134] Adachi, T., Inazuki, Y., Sutou, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Advanced FIB mask repair technology in ArF lithography Hiruta,K., Kubo,S., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Extendibility of single mask exposure for practical ArF immersion lithography T. Adachi, Y. Inazuki, T. Sutou, T. Nagai, N. Toyama, Y. Morikawa, H. Mohri, N. Hayashi SPIE - The International Society of Optical Engineering	9 Conference Proceedings Advanced FIB mask repair technology for ArF lithography: ？ Kubo,S., Hiruta,K., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Lithographic performance comparison with various RET for 45-nm node with hyper NA [6283-67] Adachi,T., Inazuki, Y., Sutou, T., Kitahata, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Characteristics optimization of mask materials for hyper-NA lithography Y. Morikawa, T. Suto, T. Nagai, Y. Inazuki, T. Adachi, Y. Kitahata, T. Yokoyama, N. Toyama, H. Mohri, N. Hayashi SPIE - The International Society of Optical Engineering
5 Conference Proceedings 100-nm alternating PSM structure discussion for ArF lithography Morikawa,Y., Kokubo,H., Nara,M., Miyashita,H., Hayashi,N. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Advanced FIB mask repair technology for 100-nm/ArF lithography Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Pupil plane analysis on AIMS 45-193i for advanced photomasks Y. Morikawa, T. Sutou, K. Mesuda, T. Nagai, Y. Inazuki, T. Adachi, N. Toyama, H. Mohri, N. Hayashi, U. Stroessner, R. … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Advanced FIB mask repair technology for 90-nm/ArF lithography: III Tanaka, Y., Itou, Y., Yoshioka, N., Hagiwara, R., Yasaka, A., Takaoka, O., Kozakai, T., Koyama, Y., Sawaragi, H., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12