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Source polarization and OPC effects on illumination optimization [5992-103]

Author(s):
Brist, T.
Bailey, G. E.
Drozdov, A.
Torres, A. ( Mentor Graphics Corp. (USA) )
Estroff, A.
Hendrickx., E. ( IMEC (Belgium) )
1 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
599232
Page(to):
599232
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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