Blank Cover Image

Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment [5992-92]

Author(s):
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
2
Page(from):
59922R
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment

Chou, W.Y., Yen, S.M., Wu, J.K., Shieh, W.B., Chuang, M., Fan, G., Tseng, C.C., Hughes, G.P., MacDonald, S.S., Holiday, …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Aqueous Based Single Wafer Cleaning Process Development and Integration Into 65 nm Process Flow Using Metal Hard Mask

Lin, Miao-Chun, Wang, Mei-Qi, Weng, Cheng-Ming, Chou, Chopin, Liao, J.H., Tang, Jianshe, Weng, Willey, Lu, Wei, Chen, …

Materials Research Society
2 Conference Proceedings The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]

Cheng, Y. F., Chou, Y. L., Yang, C. H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Implementation of random contact hole design with CPL mask by using IML technology [5992-108]

Hsu, M., Van Den Broeke, D., Hsu, S., Chen, J. F., Shi, X., Corcoran, N., Yu, L.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141]

Su, B., Verma, G., Wolk, W., Ahmadian, M., Du, H., Vikram, A., Andrews, S., Cheng, Y. F., Chou, Y. L., Yang, C. H., Lin, …

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography

Tan, S.-K., Lin, Q., Hsia, L.C., Sun, S.-C.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Process window optimization of CPL mask for beyond 45nm lithography

S. Y. Tan, Q. Lin, C. J. Tay, C. Quan

SPIE - The International Society of Optical Engineering
10 Conference Proceedings The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]

Cho, W. I., Park, J. H., Chung, D. H., Choi, S. W., Han, W. S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Study of chromeless mask quartz defect detection capability for 80-nm post structure [6349-136]

Lu, J., Wang, B., Chen, F. F., Wang, O., Chou, J., Lin, O., Cheng, J., Chen, E., Yu, P.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Study of dry etching pattern profile of chromeless phase lithography (CPL) mask

Lin, J., Hsu, M., Hsu, T., Hsu, S.D., Shi, X., Van Den Broeke, D.J., Chen, J.F., Tang, F.C., Hsieh, W.A., Huang, C.Y.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector [5992-06]

Huang, J., Peng, L. -H., Chu, C. -W, Bhattackharyya, K., Eynon, B., Mirzaagha, F., Dibiase, T., Son, K., Cheng, J., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings CPL mask technology for sub-100-nm contact hole imaging

Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12