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Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62]

Author(s):
Ma, J.
Han, K.
Lee, K.
Korobko, Y.
Silva, M.
Chavez, J.
Irvine, B.
Henrichs, S.
Chakravorty, K.
Olshausen, R.
Chandramouli, M.
Mammen, B.
Padmanaban, R. ( Intel Corp (USA) )
8 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
59921P
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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