The impact of attenuated phase shift mask topography on hyper-NA lithography [5992-36]

The impact of attenuated phase shift mask topography on hyper-NA lithography [5992-36]

Author(s):

Mack, C. A.
Smith, M. D.
Graves, T. ( KLA-Tencor Corp (USA) )

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

1

Page(from):

59920Z

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

Similar Items:

1 Conference Proceedings Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks Ma,Z.M., Mack,C.A. SPIE-The International Society for Optical Engineering	7 Conference Proceedings TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Methods for benchmarking photolithography simulators: Part III [5992-189] Smith, M. D., Graves, T., Byers, J. D., Mack, C. A. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Methods for benchmarking photolithography simulators: part IV [6154-110] Graves, T., Smith, M. D., Mack, C. A. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka SPIE - The International Society of Optical Engineering	9 Conference Proceedings Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography Lu, Z. G., Cui, Y., Thomas, A. C., Mansfield, S. M., Kunkel, G., Dobuzinsky, D., Zach, F. X., Liu, D., Chen, K. -J. R., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings The impact of mask topography on binary reticles at the 65-nm node Smith, M. D., Byers, J. D., Mack, C. A. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Mask topography effects of hole patterns on hyper-NA lithography A. Mimotogi, M. Itoh, S. Mimotogi, K. Sato, T. Sato, S. Tanaka SPIE - The International Society of Optical Engineering
5 Conference Proceedings Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Development of an i-line attenuated phase shift process for dual inlay interconnect lithography Sturtevant,J.L., Ho,B.C.P., Geiszler,V.C., Herrick,M.T., King,C.F., Carter,R.L., Roman,B.J., Litt,L.C., Smith,B., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12