Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28]
- Author(s):
Rody, Y. ( Philips Semiconductors (France) ) Martin, P. ( Photronics France S.A.S. (France) ) Couderc, C. ( Philips Semiconductors (France) ) Sixt, P. ( Photronics, Inc. (USA) ) Gardin, C. Lucas, K. Patterson, K. ( Freescale Semiconductor Inc. (France) ) Miramond-Collet, C. ( STMicroelectronics (France) ) Belledent, J. ( Philips Semiconductors (France) ) Boone, R. ( Freescale Semiconductor Inc. (France) ) Borjon, A. ( Philips Semiconductors (France) ) Trouiller, Y. ( LETI-CEA (France) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 59920R
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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