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Evaluation of quartz dry etching performance for next generation phase-shift mask applications [5992-27]

Author(s):
Anderson, S. A. ( Applied Materials Inc. (USA) )
Konishi, T. ( Toppan Printing Co., Ltd. (Japan) )
Koch, R.
Yokoi, S.
Kumar, A.
Ibrahim, I. ( Applied Materials Inc. (USA) )
1 more
Publication title:
25th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5992
Pub. Year:
2005
Pt.:
1
Page(from):
59920Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
Language:
English
Call no.:
P63600/5992
Type:
Conference Proceedings

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