A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19]

A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19]

Author(s):

Cottle, R. ( Photronics Inc. (USA) )

Sixt, P. ( Photronics France S.A.S. Crolles (France) )

Lassiter, M.

Cangemi, M.

Martin, P.

Progler, C. ( Photronics Inc. (USA) )

1 more

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

1

Page(from):

59920J

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

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