Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]

Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]

Author(s):

Becker, H.

Hess, G. ( Schott Lithotec AG (Germany) )

2 more

Publication title:

25th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5992

Pub. Year:

2005

Pt.:

1

Page(from):

59920I

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

Language:

English

Call no.:

P63600/5992

Type:

Conference Proceedings

Details

TDL ID:	ZA00016029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2005 : 25th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2005.10.04-2005.10.07

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2 Conference Proceedings Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography Becker, H.W., Chey, J., Sobel, F., Schmidt, F., Renno, M., Buttgereit, U., Angelopoulos, M., Hess, G., Knapp, K. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Determination of mask layer stress by placement metrology [5992-130] Butschke, J., Buttgereit, U., Cotte, E., Hess, G., Irmscher, M., Seitz, H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography Becker, H.W., Schmidt, F., Sobel, F., Renno, M., Buttgereit, U., Chey, J., Angelopoulos, M., Knapp, K., Hess, G. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Dry etch behavior of different TaN absorber layers for EUVL mask making F. Letzkus, G. Hess, M. Irmscher, K. Knapp, M. Renno, E. Roehrle, H. Seitz SPIE - The International Society of Optical Engineering
4 Conference Proceedings New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM Becker, H. W., Schley, P., Schmidt, F., Sobel, F., Renno, M., Olschewski, N., Seitz, H., Buttgereit, U., Knapp, K., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber Sobel, F., Aschke, L., Rueggeberg, F., Seitz, H., Olschewski, N., Reichhardt, T., Becker, H., Renno, M., Kirchner, S., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Absorber stack optimization toward EUV lithography mask blank pilot production Sobel, F., Aschke, L., Renno, M., Seitz, H., Becker, H. W., Olschewski, N., Reichardt, T., Hess, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Update on the EUVL mask blank activity at Schott Lithotec Sobel, F., Aschke, L., Becker, H.W., Renno, M., Ruggeberg, F., Kirchner, S., Leutbecher, T., Olschewski, N., Schiffler, … SPIE - The International Society of Optical Engineering
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