Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09]
- Author(s):
Kim, D. Y. Cho, W. I. Park, J. H. Chung, D. H. Cha, B. C. Choi, S. W. Han, W. S. ( Samsung Electronics Co., Ltd (South Korea) ) Park, K. H. Kim, N. W. Hess, C. Ma, W. Kim, D. ( KLA-Tencor Corp (USA) ) - Publication title:
- 25th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5992
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 599209
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- Language:
- English
- Call no.:
- P63600/5992
- Type:
- Conference Proceedings
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