Laser ablation of SiOx thin films for direct mask writing [5963-79]

Laser ablation of SiOx thin films for direct mask writing [5963-79]

Author(s):

Heber, J. ( Fraunhofer Institut fur Photonische Mikrosysteme (Germany) )
Ihlemann, J.
Schulz-Ruhtenberg, M. ( Laser-Lab. Gottingen e.V. (Germany) )
Schmidt, J. ( Fraunhofer Institut fur Photonische Mikrosysteme (Germany) )

Publication title:

Advances in optical thin films II : 13-15 September 2005, Jena, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5963

Pub. Year:

2005

Page(from):

596326

Page(to):

596326

Pages:

1

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459817 [081945981X]

Language:

English

Call no.:

P63600/5963

Type:

Conference Proceedings

Details

TDL ID:	ZA00016000
Series ID:	PA00000029
Conf. info. (Name):	SPIE Optical Systems Design : Advances in optical thin films
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Jena, Germany
Conf. info. (Date):	2005.09.13-2005.09.15

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