Comparisons between EUV at-wavelength metrological methods [5921-15] | 東京工業大学附属図書館文献データベース

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Comparisons between EUV at-wavelength metrological methods [5921-15]

Author(s):

Murakami, K. ( EUVA Sagamihara R&D Ctr. (Japan) )

Yokota, H. ( Euva Utsunomiya R&R CTr. (Japan) )

Niibe, M. ( Univ. of Hoyogo (Japan) )

Takeda, M. ( Univ. of Electro-Communications (Japan) )

Publication title:

Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5921

Pub. Year:

2005

Page(from):

59210D

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459268 [0819459267]

Language:

English

Call no.:

P63600/5921

Type:

Conference Proceedings

Details

TDL ID:	ZA00015958
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Advances in metrology for x-ray and EUV optics
Conf. info. (Number):	2005
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2005.08.02-2005.08.03

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