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Effect of exposure intensity on the photochecmical reaction speed of the lithography for thick film resists [5878-57]

Author(s):
Publication title:
Advanced characterization techniques for optics, semiconductors, and nanotechnologies II : 2-4 August, 2005, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5878
Pub. Year:
2005
Page(from):
58781G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458834 [081945883X]
Language:
English
Call no.:
P63600/5878
Type:
Conference Proceedings

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