Effect of exposure intensity on the photochecmical reaction speed of the lithography for thick film resists [5878-57]
- Author(s):
- Publication title:
- Advanced characterization techniques for optics, semiconductors, and nanotechnologies II : 2-4 August, 2005, San Diego, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5878
- Pub. Year:
- 2005
- Page(from):
- 58781G
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458834 [081945883X]
- Language:
- English
- Call no.:
- P63600/5878
- Type:
- Conference Proceedings
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