Improvement in total measurement uncertainty for gate CD control [5878-24]
- Author(s):
Bunday, B. D. ( ISMI (USA); ) Sirjgabu, O. Wen, Y. Paranipe, A. Terbeek, P. ( Therma-Wave, Inc. (USA) ) Allgair, J. Peterson, A., ( ISMI (USA) ) - Publication title:
- Advanced characterization techniques for optics, semiconductors, and nanotechnologies II : 2-4 August, 2005, San Diego, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5878
- Pub. Year:
- 2005
- Page(from):
- 58780M
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458834 [081945883X]
- Language:
- English
- Call no.:
- P63600/5878
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Determination of optimal parameters for CD-SEM measurement of line-edge roughness
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Automated CD-SEM recipe creation: a new paradigm in CD-SEM utilization [6152-47]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Small feature accuracy challenge for CD-SEM metrology: physical model solution [6152-28]
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Progress on implementation of a CD-AFM・based reference measurement system [6152-24]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control and several different CMOS features
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |