Hafnium oxide for optical applications deposited by different CMOS compatible methods [5870-21]

Hafnium oxide for optical applications deposited by different CMOS compatible methods [5870-21]

Author(s):

Albert, M.

Rotler, T.

Adolphi, B.

Bartha, J W.. ( Technische Univ. Dresden (Germany); )

Gruger, H.

Kunath, C.

Sarge, S. ( Fraunhofer-Institut fur Phatonische Mikrosysteme (Germany) )

2 more

Publication title:

Advances in thin film coatings for optical applications II : 1-2 August 2005, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5870

Pub. Year:

2005

Page(from):

58700M

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458759 [0819458759]

Language:

English

Call no.:

P63600/5870

Type:

Conference Proceedings

Details

TDL ID:	ZA00015909
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Advances in thin film coatings for optical applications
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2005.08.01-2005.08.02

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