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Mechanism of Charge Trapping Reduction in Scaled High-k Gate Stacks

Author(s):
Publication title:
Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices
Title of ser.:
NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.:
220
Pub. Year:
2006
Page(from):
227
Page(to):
237
Pages:
11
Pub. info.:
Dordrecht: Springer
ISBN:
9781402043659 [1402043651]
Language:
English
Call no.:
N17050/220
Type:
Conference Proceedings

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