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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Author(s):
Publication title:
Advanced materials forum III : proceedings of the III International Materials Symposium Materiais 2005 and XII Encontro da Sociedade Portuguesa de Materiais - SPM Universidade de Aveiro, March 20-23, Aveiro, Portugal, 2005
Title of ser.:
Materials science forum
Ser. no.:
514-516
Pub. Year:
2006
Pt.:
1
Page(from):
475
Page(to):
482
Pages:
8
Pub. info.:
Uetikon-Zuerich, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878494026 [0878494022]
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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