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Determination of Residual Resist Layer Thickness in E-Beam Lithography Based on Energy Dispersive X-Ray Spectrometer

Author(s):
Publication title:
Progress on advanced manufacture for micro/nano technology 2005 : proceedings of the 2005 International Conference on Advanced Manufacture Taipei, Taiwan, R.O.C. November 28th-December 2nd, 2005
Title of ser.:
Materials science forum
Ser. no.:
505-507
Pub. Year:
2006
Pt.:
1
Page(from):
43
Page(to):
48
Pages:
6
Pub. info.:
Uetikon-Zuerich: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499908 [0878499903]
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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